High-sensitive ultrathin negative electron beam resist based on Langmuir-Blodgett films of polycyanoacrylate

被引：0

作者：

Pisignano, Dario ^{[1
]}

Berzina, Tatiana ^{[2
]}

Erokhin, Victor ^{[2
]}

Fontana, Marco P. ^{[2
]}

Della Torre, Antonio ^{[1
]}

Visconti, Paolo ^{[1
]}

Rinaldi, Ross ^{[1
]}

机构：

[1] C/o Dipto. Ingegneria Innovazione, INFM, University of Lecce, via Arnesano, I-73100 Lecce, Italy

[2] INFM, Department of Physics, University of Parma, Viale delle Scienze, I-43100 Parma, Italy

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2004年 / 43卷 / 6 B期

关键词：

Atomic force microscopy - Deposition - Electron beam lithography - Electron beams - Langmuir Blodgett films - Molecular structure - Monolayers - Nanostructured materials - Nanotechnology - Ultrathin films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We carried out an electron-beam lithography study of the sub-μm performances of Langmuir-Blodgett films of Polycyanoacrylates fabricated by the Langmuir-Schaefer technique. We tested the sensitivity of films made by 48 monolayers, finding a dose of less than 1 μC/cm2, and employed them as masks for wet etching of Cr metal layers, with resolutions up to 100nm. These results suggest that the modified Langmuir-Schaefer technique, and the Polycyanoacrylate-based resists, are very promising for nanotechnology applications.

引用

页码：3984 / 3985

共 50 条

[1] High-sensitive ultrathin negative electron beam resist based on Langmuir-Blodgett films of polycyanoacrylate
Pisignano, D
Berzina, T
Erokhin, V
Fontana, MP
Della Torre, A
Visconti, P
Rinaldi, R
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (6B): : 3984 - 3985
[2] POLYMETHYLMETHACRYLATE LANGMUIR-BLODGETT FILMS FOR HIGH RESOLUTION ELECTRON BEAM RESIST
鲁武
顾宁
韦钰
沈浩瀛
张岚
JournalofElectronics(China), 1994, (03) : 247 - 252
[3] AN INVESTIGATION OF THE BACKSCATTERING YIELD OF LANGMUIR-BLODGETT RESIST FILMS IN ELECTRON-BEAM LITHOGRAPHY
LU, W
GU, N
LU, ZH
WEI, Y
MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING, 1994, 2 (04) : 913 - 920
[4] LANGMUIR-BLODGETT FILMS - THE ULTRATHIN BARRIER
PITT, C
ELECTRONICS AND POWER, 1983, 29 (03): : 226 - 229
[5] Ultrathin ferroelectric Langmuir-Blodgett films
Sorokin, A
Palto, S
Blinov, L
Fridkin, V
Yudin, S
MOLECULAR CRYSTALS AND LIQUID CRYSTALS SCIENCE AND TECHNOLOGY SECTION C-MOLECULAR MATERIALS, 1996, 6 (01): : 61 - 67
[6] High-resolution electron beam lithography with Langmuir-Blodgett films
Kim, CN
Kang, DW
Kim, ER
Lee, HW
MOLECULAR CRYSTALS AND LIQUID CRYSTALS SCIENCE AND TECHNOLOGY SECTION A-MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 1997, 294 : 479 - 482
[7] SUPERIORITY OF LANGMUIR-BLODGETT RESIST FILMS IN ELECTRON-BEAM LITHOGRAPHY AS DEMONSTRATED BY THE BACKSCATTERING YIELD
LU, W
SHEN, HY
GU, N
YUAN, CW
LU, ZH
WEI, Y
THIN SOLID FILMS, 1994, 243 (1-2) : 501 - 504
[8] POLYMERIZATION IN LANGMUIR-BLODGETT FILMS AND RESIST APPLICATIONS
BARRAUD, A
THIN SOLID FILMS, 1983, 99 (1-3) : 317 - 321
[9] Multilayered ultrathin ferroelectric Langmuir-Blodgett films
Batirov, TM
Ducharme, S
Fridkin, VM
Kuznetsova, N
Palto, SP
Verkhovskaya, KA
Vizdrik, G
Yudin, SG
INTEGRATED FERROELECTRICS, 2001, 37 (1-4) : 485 - 492
[10] Ultrathin polymer Langmuir-Blodgett films for microlithography
Li, TS
Mitsuishi, M
Miyashita, T
THIN SOLID FILMS, 2004, 446 (01) : 138 - 142

← 1 2 3 4 5 →