Effects of H2O on atomic hydrogen generation in hydrogen plasma

被引：0

作者：

Kikuchi, Jun ^{[1
]}

Fujimara, Shuzo ^{[1
]}

Suzuki, Masafumi ^{[1
]}

Yano, Hiroshi ^{[1
]}

机构：

[1] Fujitsu Ltd, Kawasaki, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 6 B期

关键词：

Atoms - Hydrogen - Plasma applications - Quartz - Spectroscopic analysis;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The effects of water vapor added to hydrogen plasma were investigated by measuring the relative concentrations of hydrogen atoms in the plasma and in the downstream. The added water vapor increased the concentration of hydrogen atoms in the downstream to an amount 80 times greater than that without addition of water vapor. The relative concentration of hydrogen atoms generated from water-vapor-added hydrogen gas was only slightly decreased in the downstream. To clarify the role of water vapor, we examined the behavior of oxygen atoms and OH radicals. As a result, it was revealed that water vapor passivated the quartz surface and the recombination of hydrogen atoms was prevented.

引用

页码：3120 / 3124

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