Transformerless and Pulse-Modulated Power Source of Magnetron Sputtering Units from an AC Supply Line

被引:0
|
作者
Kuz'michev, A. I.
机构
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 30 条
  • [21] Thyristor generators for pulse excitation of electromagnets with direct supply from AC line
    Baginskii, B.A.
    Braslavskii, G.D.
    Instruments and experimental techniques New York, 1988, 31 (3 pt 2): : 702 - 707
  • [22] Time evolution in visible light emission from high-power Ar pulse-modulated induction thermal plasmas
    Tanaka, Y
    Taniguchi, K
    Muroya, T
    Uesugi, Y
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2005, 33 (02) : 406 - 407
  • [23] Evaluation of diamond-like carbon films electrodeposited on an Al substrate from the liquid phase with pulse-modulated power
    Guo, D
    Cai, K
    Li, LT
    Huang, Y
    Gui, ZL
    Zhb, HS
    CARBON, 2001, 39 (09) : 1395 - 1398
  • [24] High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering
    Lin, Jianliang
    Sproul, William D.
    Moore, John J.
    Lee, Sabrina
    Myers, Sterling
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 (10): : 3226 - 3234
  • [25] Properties of Co-deposited indium tin oxide and zinc oxide films using a bipolar pulse power supply and a dual magnetron sputter source
    Hwang, MS
    Jeong, HS
    Kim, WM
    Seo, YW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 1399 - 1403
  • [26] A Nonintrusive Power Supply Design for Self-Powered Sensor Networks in the Smart Grid by Scavenging Energy From AC Power Line
    Han, Jinchi
    Hu, Jun
    Yang, Yang
    Wang, Zhongxu
    Wang, Shan X.
    He, Jinliang
    IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS, 2015, 62 (07) : 4398 - 4407
  • [27] Preparation of Titanium-Doped Diamond-Like Carbon Films With Electrical Conductivity Using High Power Pulsed Magnetron Sputtering System With Bipolar Pulse Voltage Source for Substrate
    Kimura, Takashi
    Kamata, Hikaru
    Nakao, Setsuo
    Azuma, Kingo
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2016, 44 (12) : 3083 - 3090
  • [28] Preparation of diamond-like carbon films using reactive Ar/CH4 high power impulse magnetron sputtering system with negative pulse voltage source for substrate
    Kimura, Takashi
    Kamata, Hikaru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (04)
  • [29] Understanding the deformation and cracking behavior of Cr-based coatings deposited by hybrid direct current and high power pulse magnetron sputtering: From nitrides to oxynitrides
    Broegelmann, T.
    Bobzin, K.
    Kruppe, N. C.
    Arghavani, M.
    THIN SOLID FILMS, 2019, 688
  • [30] Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl2 gas mixtures and a separate supply of nitrogen precursors from a high density radical source
    Tanide, Atsushi
    Nakamura, Shohei
    Horikoshi, Akira
    Takatsuji, Shigeru
    Kohno, Motohiro
    Kinose, Kazuo
    Nadahara, Soichi
    Nishikawa, Masazumi
    Ebe, Akinori
    Ishikawa, Kenji
    Hori, Masaru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58 (SA)