Development of poly-Si TFT in NEC

This paper is an introduction to a group of five papers on poly-Si Thin Film Transistor (TFT) research and development within NEC. Poly-Si TFT is a core technology for next generation LCDs (Liquid Crystal Displays), sensors and other application devices. Especially, low temperature poly-Si TFTs are very promising because of their wide application range. NEC Corporation has been conducting research of low temperature poly-Si process such as excimer laser process technology including annealing and doping, process temperature lowering by RPCVD (Remote Plasma-Enhanced Chemical Vapor Deposition), and development of many kinds of input/output devices, especially light valves and novel pen-shaped scanner. Future research would create a new market by developing plastic substrate compatible process and single crystalline silicon on a glass substrate.