Planarization of dielectrics used in the manufacture of very-large-scale integrated circuits

被引：0
|
作者：
Malik, Farid [1 ]
Solanki, Raj [1 ]
机构：
[1] Intel Corp, Rio Rancho, United States
来源：
Thin Solid Films | 1990年 / 194卷 / 1 -2 pt 2期
关键词：
Planarization;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：1030 / 1037
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