Optical response of free-carrier plasma effects of MeV ion implanted silicon

被引：0
|
作者：
Yu, Yuehui [1 ]
Zou, Shichang [1 ]
Zhou, Zhuying [1 ]
Zhao, Guoqing [1 ]
机构：
[1] Shanghai Inst of Metallurgy, The Chinese Acad of Science, Shanghai, China
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 1995年 / 16卷 / 10期
关键词：
D O I：
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学科分类号：
摘要：
5
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页码：759 / 765
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