Study of small gap microstrip gas chamber

被引：0

作者：

Yu, Z.Q. ^{[1
]}

Wang, S.S. ^{[1
]}

Wei, H.J. ^{[1
]}

Chu, M.L. ^{[1
]}

Teng, P.K. ^{[1
]}

机构：

[1] Inst of Physics, Taipei, Taiwan

来源：

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment | 1996年 / 372卷 / 1-2期

关键词：

Aluminum - Anodes - Electric discharges - Etching - Gain measurement - Microstrip devices - Performance - Photolithography - Plate metal - Silicon wafers - Stability - Thick films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We report on the performance of small gap MSGCs. The maximum gain for small gap MSGCs is about 1000. Small gap MSGCs with anode width of 3 μm at low rate (approx.10 Hz/mm2) have good operational stability. The gas gain varies less than ±1% during a 20 h period.

引用

页码：35 / 38