FMR investigation of Fe(111) thin films

被引：0
|
作者：
Rezende, S.M. [1 ]
Moura, J.A.S. [1 ]
de Aguiar, F.M. [1 ]
Schreiner, W.H. [1 ]
机构：
[1] Universidade Federal de Pernambuco, Recife-PE, Brazil
来源：
Journal of Magnetism and Magnetic Materials | 1995年 / 140-144卷 / pt 1期
关键词：
Crystal orientation - Deposition - Epitaxial growth - Ferromagnetic resonance - Iron - Magnetic anisotropy - Magnetic fields - Magnetization - Phase equilibria - Silicon - Stresses;
D O I：
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学科分类号：
摘要：
The in-plane anisotropy of Fe films deposited by e-beam on Si(111) has been investigated by FMR at X-band frequencies. Resonance field data as a function of the field orientation confirm that the films grow epitaxially with excellent crystallinity in the [111] orientation. We also show that since the first-order crystal anisotropy energy does not vary in the (111) plane, it is possible to obtain precise measurements of the small second-order and stress induced in-plane anisotropy, as well as minute misorientations from the (111) plane.
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页码：663 / 664
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