Analytical calculations of intrinsic carrier concentration and effective state densities in strained Si1-xGex layers

被引:0
|
作者
Zhang, Wanrong [1 ]
Zeng, Zheng [1 ]
Luo, Jinsheng [1 ]
机构
[1] Xi'an Jiaotong Univ, China
来源
Guti Dianzixue Yanjiu Yu Jinzhan/Research and Progress of Solid State Electronics | 1996年 / 16卷 / 04期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
14
引用
收藏
页码:314 / 318
相关论文
共 50 条
  • [1] Calculation of the intrinsic carrier concentration of strained Si1-xGex layers
    College of Physics and Telecommunication, South China Normal University, Guangzhou 510006, China
    Guti Dianzixue Yanjiu Yu Jinzhan, 2007, 4 (449-451+467):
  • [2] Intrinsic carrier concentration in strained Si1-xGex/(101)Si
    Song, Jian-Jun
    Zhang, He-Ming
    Hu, Hui-Yong
    Dai, Xian-Ying
    Xuan, Rong-Xi
    OPTOELECTRONIC MATERIALS, PTS 1AND 2, 2010, 663-665 : 470 - 472
  • [3] Analytical calculation of effective densities of states, intrinsic carrier concentration and ionized doping concentration in strained Si1-xGex alloys on (001)Si substrates at room and low temperatures
    Zhang, WR
    Zheng, Z
    Luo, JS
    CRYOGENICS, 1996, 36 (11) : 915 - 919
  • [4] Analytical calculation of effective densities of states, intrinsic carrier concentration and ionized doping concentration in strained Si1-xGex alloys on (001) Si substrates at room and low temperatures
    Xi'an Jiaotong Univ, Xi'an, China
    Cryogenics, 11 (915-919):
  • [5] SPECTROSCOPIC ELLIPSOMETRY OF STRAINED SI1-XGEX LAYERS
    LIBEZNY, M
    POORTMANS, J
    CAYMAX, M
    VANAMMEL, A
    KUBENA, J
    HOLY, V
    VANHELLEMONT, J
    THIN SOLID FILMS, 1993, 233 (1-2) : 158 - 161
  • [6] The spectrum hole in the strained layers Si1-xGex
    Sychev, AY
    Makarov, EA
    IEEE 2001 SIBERIAN RUSSIAN STUDENT WORKSHOPS ON ELECTRON DEVICES AND MATERIALS PROCEEDINGS, 2001, : 24 - 25
  • [7] PHOTOREFLECTANCE STUDY OF STRAINED (001) SI1-XGEX/SI LAYERS
    YIN, YC
    POLLAK, FH
    AUVRAY, P
    DUTARTRE, D
    PANTEL, R
    CHROBOCZEK, JA
    THIN SOLID FILMS, 1992, 222 (1-2) : 85 - 88
  • [8] Boron diffusion in strained Si1-xGex epitaxial layers
    Moriya, N.
    Feldman, L.C.
    Luftman, H.S.
    King, C.A.
    Bevk, J.
    Freer, B.
    1600, (71):
  • [9] Electroreflectance spectroscopy of strained Si1-xGex layers on silicon
    Ebner, T
    Thonke, K
    Sauer, R
    Schaffler, F
    Herzog, HJ
    APPLIED SURFACE SCIENCE, 1996, 102 : 90 - 93
  • [10] Electroreflectance spectroscopy of strained Si1-xGex layers on silicon
    Ebner, T
    Thonke, K
    Sauer, R
    Schaeffler, F
    Herzog, HJ
    PHYSICAL REVIEW B, 1998, 57 (24) : 15448 - 15453