LASER ANNEALING.

被引：0
|
作者：
Ready, J.F.
McClure, B.Thompson
Larson, W.L.
机构：
来源：
Semiconductor International | 1981年 / 4卷 / 11期
关键词：
HEAT TREATMENT - Annealing - LASER BEAMS - Applications;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Laser annealing techniques as a possible replacement of conventional furnace annealing in semiconductor processing are discussed.
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页码：93 / 112
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