SPUTTERING AND ION PLATING.

被引：0

作者：

Johnson, Robert L.

Mattox, Donald M.

Spalvins, Talivaldis

Wehner, Gottfried K.

Buckley, Donald H.

Chambers, Douglas L.

Carmichael, Donald C.

Wan, C.T.

Stupp, Bernard C.

Mehler, Randal A.

Rivlin, Joseph

Lamont Jr., Lawrence T.

机构：

来源：

NASA Special Publications | 1972年 / 511期

关键词：

COATING TECHNIQUES - FILMS - Preparation - METALS AND ALLOYS - Sputtering - VACUUM TECHNOLOGY;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Conference presents an overview of the field, brief treatment of concepts, new technology developments, industrial-commercial applications and equipment availability. Following is a list of titles and authors of the conference: Why Ion Plating and Sputtering? By Robert L. Johnson. Ion Plating - Concepts and Applications. By Donald M. Mattox. Characteristics of Ion Plated Films Including Mechanical Properties and Lubrication. By Talivaldis Spalvins. Fundamentals of RF and DC Sputtering. By Gottfried K. Wehner. Use of Sputtering for Deposition of Solid Film Lubricants. By Donald H. Buckley and Talivaldis Spalvins. Deposition of Metal and Alloy Coatings by Electron-Beam Ion Plating. By Douglas L. Chambers, Donald C. Carmichael, and C. T. Wan. Industrial Potential of Ion Plating and Sputtering. By Bernard C. Stupp. Industrial Sputtering for Better Decorative Coatings. By Randal A. Mehler. Availability of Commercial Ion Plating Equipment. By Joseph Rivlin. Some Properties of a Coaxial RF Diode Sputtering System. By Lawrence T. Lamont, Jr.

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