PLASMA FILAMENT ION SOURCE FOR HIGH CURRENT IMPLANTER.

被引：0

作者：

Yabe, E. ^{[1
]}

Ishizaka, N. ^{[1
]}

Shibuya, T. ^{[1
]}

Tonegawa, A. ^{[1
]}

Takayama, K. ^{[1
]}

Fukui, R. ^{[1
]}

Takagi, K. ^{[1
]}

Kikuchi, R. ^{[1
]}

Okamoto, K. ^{[1
]}

Komiya, S. ^{[1
]}

机构：

[1] Tokai Univ, Hiratsuka, Jpn, Tokai Univ, Hiratsuka, Jpn

来源：

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期

关键词：

ARGON PLASMA - MASS SPECTRA - PLASMA FILAMENT ION SOURCE;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：190 / 193

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