Influences of sputtering power and substrate temperature on the properties of RF magnetron sputtered indium tin oxide thin films

被引：0
|
作者：
Terzini, E. [1 ]
Nobile, G. [1 ]
Loreti, S. [1 ]
Minarini, C. [1 ]
Polichetti, T. [1 ]
Thilakan, P. [2 ]
机构：
[1] ENEA Centro Ricerche, Localitaá Granatello, 80055 Portici (NA), Italy
[2] ENEA/ICTP TRIL Prog.-ENEA Ctro. Ric., Localitaá Granatello, 80055 Portici (NA), Italy
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 6 A期
关键词：
D O I：
10.1143/jjap.38.3448
中图分类号：
学科分类号：
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页码：3448 / 3452
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