Calorimetric analysis of thin-film reactions: experiments and modeling in the nickel/silicon system

被引：0
|
作者：
机构：
来源：
| 1600年 / American Inst of Physics, Woodbury, NY, USA卷 / 76期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] THIN-FILM SILICON PV TECHNOLOGY
    Zeman, Miroslav
    JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS, 2010, 61 (05): : 271 - 276
  • [42] Silicon thin-film solar cells
    Fuhs, W
    NANOSTRUCTURED AND ADVANCED MATERIALS FOR APPLICATIONS IN SENSOR, OPTOELECTRONIC AND PHOTOVOLTAIC TECHNOLOGY, 2005, 204 : 293 - 298
  • [43] THIN-FILM REACTIONS ON SILICON SURFACES AND THE QUALITY OF METAL-SEMICONDUCTOR INTERFACES
    MORGEN, P
    JORGENSEN, B
    RASMUSSEN, J
    LABUNOV, VA
    LARSEN, AN
    SURFACE SCIENCE, 1986, 168 (1-3) : 212 - 224
  • [44] EVAPORATED SILICON THIN-FILM TRANSISTORS
    SALAMA, CAT
    YOUNG, L
    PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1965, 53 (12): : 2156 - &
  • [45] Polycrystalline silicon thin-film transistors
    Wagner, S
    Wu, M
    Min, BGR
    Cheng, IC
    POLYCRYSTALLINE SEMICONDUCTORS IV MATERIALS, TECHNOLOGIES AND LARGE AREA ELECTRONICS, 2001, 80-81 : 325 - 336
  • [46] METASTABILITY IN SLOW THIN-FILM REACTIONS
    TU, KN
    HERD, SR
    GOSELE, U
    PHYSICAL REVIEW B, 1991, 43 (01): : 1198 - 1201
  • [47] Thin-film inverters based on high mobility microcrystalline silicon thin-film transistors
    Chan, Kah-Yoong
    Bunte, Eerke
    Knipp, Dietmar
    Stiebig, Helmut
    SOLID-STATE ELECTRONICS, 2008, 52 (06) : 914 - 918
  • [48] ATOMIC DIFFUSION IN THIN-FILM REACTIONS
    GREER, AL
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 134 : 1268 - 1273
  • [49] CHEMICAL REACTIONS IN THIN-FILM EQUIPMENT
    MUTZENBE.AB
    GIGER, A
    TRANSACTIONS OF THE INSTITUTION OF CHEMICAL ENGINEERS AND THE CHEMICAL ENGINEER, 1968, 46 (06): : T189 - &
  • [50] DETERMINATION OF SILICON IN THIN-FILM ALUMINUM ON A SILICON SUBSTRATE
    TALLANT, DR
    ANALYTICAL CHEMISTRY, 1980, 52 (11) : 1780 - 1781
12345