Effect of GeF4 addition on the growth of hydrogenated microcrystalline silicon film by plasma-enhanced chemical vapor deposition

被引：0

作者：

Shirai, Hajime ^{[1
]}

Fukuda, Yusuke ^{[1
]}

Nakamura, Takuya ^{[1
]}

Azuma, Kazuhumi ^{[2
]}

机构：

[1] Dept. of Funct. Materials Science, Fac. Eng., Saitama Univ., 255 S., Saitama, Japan

[2] Prod. Eng. Research Laboratory, Hitachi, Ltd., 292 Yoshida-cho, T., Yokohama, Japan

来源：

Thin Solid Films | 1999年 / 350卷 / 01期

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摘要：

引用

页码：38 / 43

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