Topographic investigation of CoSi2 film on Si(100) by STM

被引：0
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作者：
Liang, Lifen [1 ]
Dong, Shuzhong [1 ]
Gu, Zhiquang [1 ]
Li, Bingzong [1 ]
机构：
[1] Fudan Univ, Shanghai, China
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 1997年 / 18卷 / 01期
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页码：50 / 53
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