X-ray monitoring system for in situ investigation of thin film growth

被引：0

作者：

Kharkov Polytechnic University, Frunze str. 21, Kharkov ^{[1
]}

310002, Ukraine

不详 ^{[2
]}

113 105, Russia

机构：

来源：

Cryst Res Technol | / 5卷 / 643-649期

关键词：

Monitoring - Optical systems - Thin films - Reflection;

D O I：

暂无

中图分类号：

TN2 [光电子技术、激光技术];

学科分类号：

0803 ; 080401 ; 080901 ;

摘要：

The X-ray optical system of in situ monitoring of reflectivity measured in the short-wave range 0.5-3 Å is proposed. Thickness, density, and microroughness of the growing film are determined for every half-wave of reflectivity oscillations that corresponds to the averaging by the layer of 10 Å thickness. By the example of diamond-like film growing, the possibility of an analysis of transition processes and technology failure during film growth have been shown. Copyright © 1995 WILEY-VCH Verlag GmbH & Co. KGaA.

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