X-ray monitoring system for in situ investigation of thin film growth

被引：0
|
作者：
Kharkov Polytechnic University, Frunze str. 21, Kharkov [1 ]
310002, Ukraine
不详 [2 ]
113 105, Russia
机构：
来源：
Cryst Res Technol | / 5卷 / 643-649期
关键词：
Monitoring - Optical systems - Thin films - Reflection;
D O I：
暂无
中图分类号：
TN2 [光电子技术、激光技术];
学科分类号：
0803 ; 080401 ; 080901 ;
摘要：
The X-ray optical system of in situ monitoring of reflectivity measured in the short-wave range 0.5-3 Å is proposed. Thickness, density, and microroughness of the growing film are determined for every half-wave of reflectivity oscillations that corresponds to the averaging by the layer of 10 Å thickness. By the example of diamond-like film growing, the possibility of an analysis of transition processes and technology failure during film growth have been shown. Copyright © 1995 WILEY-VCH Verlag GmbH & Co. KGaA.
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