X-ray monitoring system for in situ investigation of thin film growth

The X-ray optical system of in situ monitoring of reflectivity measured in the short-wave range 0.5-3 Å is proposed. Thickness, density, and microroughness of the growing film are determined for every half-wave of reflectivity oscillations that corresponds to the averaging by the layer of 10 Å thickness. By the example of diamond-like film growing, the possibility of an analysis of transition processes and technology failure during film growth have been shown. Copyright © 1995 WILEY-VCH Verlag GmbH & Co. KGaA.