Sputtering yield measurements during low energy xenon plasma bombardment

被引：0
|
作者：
Doerner, R.P. [1 ]
Whyte, D.G. [2 ]
Goebel, D.M. [3 ]
机构：
[1] Center for Energy Research, Univ. of California at San Diego, San Diego, CA 92093, United States
[2] University of Wisconsin-Madison, Madison, WI 53706, United States
[3] Boeing Space and Communications, Torrance, CA 90505, United States
来源：
Journal of Applied Physics | 2003年 / 93卷 / 09期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
21
引用
收藏
页码：5816 / 5823
相关论文
共 50 条
  • [41] ENERGY-DEPENDENCE OF THE SPUTTERING YIELD OF GALLIUM-ARSENIDE BY ARGON ION-BOMBARDMENT
    BHATTACHARYA, SR
    GHOSE, D
    BASU, D
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1987, 25 (09) : 328 - 330
  • [42] ENERGY SPECTRUM OF CATHODE SPUTTERING PRODUCTS DURING BOMBARDMENT OF A METAL BY HEAVY IONS
    VEKSLER, VI
    SOVIET PHYSICS SOLID STATE,USSR, 1970, 11 (11): : 2540 - +
  • [43] IN QUEST OF THE SPIKE - ENERGY-DEPENDENCE OF THE SPUTTERING YIELD OF ZINC BOMBARDED WITH NEON AND XENON IONS
    ZALM, PC
    BECKERS, LJ
    PHILIPS JOURNAL OF RESEARCH, 1984, 39 (1-2) : 11 - 23
  • [44] ENERGY-DEPENDENCE OF THE SPUTTERING YIELD OF SILICON BOMBARDED WITH NEON, ARGON, KRYPTON, AND XENON IONS
    ZALM, PC
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2660 - 2666
  • [45] Measurement of the scintillation yield of low-energy electrons in liquid xenon
    Aprile, E.
    Budnik, R.
    Choi, B.
    Contreras, H. A.
    Giboni, K. -L.
    Goetzke, L. W.
    Koglin, J. E.
    Lang, R. F.
    Lim, K. E.
    Fernandez, A. J. Melgarejo
    Persiani, R.
    Plante, G.
    Rizzo, A.
    PHYSICAL REVIEW D, 2012, 86 (11):
  • [46] Stoichiometry changes during low energy oxygen bombardment
    Nucl Instrum Methods Phys Res Sect B, 1-4 (614):
  • [47] SPUTTERING PHENOMENA OF COSI2 UNDER LOW-ENERGY OXYGEN BOMBARDMENT
    BRIJS, B
    DECOSTER, W
    BENDER, H
    ALAY, J
    OSICEANU, P
    VANDERVORST, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 85 (1-4) : 306 - 310
  • [48] Chemical sputtering of carbon films by low energy N-2(+) ion bombardment
    Hammer, P
    Gissler, W
    DIAMOND AND RELATED MATERIALS, 1996, 5 (10) : 1152 - 1158
  • [49] Sputtering yields for low-energy Ar+- and Ne+-ion bombardment
    Somogyvari, Z.
    Langer, G. A.
    Erdelyi, G.
    Balazs, L.
    VACUUM, 2012, 86 (12) : 1979 - 1982
  • [50] SPUTTERING YIELDS FOR NORMALLY INCIDENT HG+-ION BOMBARDMENT AT LOW ION ENERGY
    WEHNER, GK
    PHYSICAL REVIEW, 1957, 108 (01): : 35 - 45
12345