Properties of Diffusion Resistors in the High-Frequency Region.

被引：0

作者：

Brochocki, Andrzej

Kalkusinska, Lucyna

Stolarski, Edward

机构：

来源：

Archiwum Elektrotechniki (Warsaw) | 1973年 / 22卷 / 01期

关键词：

INTEGRATED CIRCUIT MANUFACTURE;

D O I：

暂无

中图分类号：

TN [电子技术、通信技术];

学科分类号：

0809 ;

摘要：

The construction and electrical properties of diffusion resistors applied in integrated circuits are discussed. Admittance measurements in the frequency range 0. 1 to 250 MHz of resistors obtained by various technological processes and having different geometry have been performed. For comparison purposes, measurements of carbon-, metal- and thick-film resistors were carried out.

引用

页码：143 / 158