Fluorine-contained films with high water-repellency and transparency prepared by RF plasma-enhanced CVD

被引：0

作者：

Hozumi, A. ^{[1
]}

Kakinoki, N. ^{[1
]}

Asai, Y. ^{[1
]}

Takai, O. ^{[1
]}

机构：

[1] Nagoya Univ, Nagoya, Japan

来源：

| 1996年 / Chapman & Hall Ltd, London, United Kingdom卷 / 15期

关键词：

Angle measurement - Chemical vapor deposition - Contact angle - Fluorine containing polymers - Fourier transform infrared spectroscopy - Optical properties - Optical variables measurement - Plasma applications - Silanes - Substrates - Transparency - X ray photoelectron spectroscopy;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

This paper prepares highly water-repellant and transparent fluorine-containing films on various substrates, such polycarbonatae, Si and glass, by RF plasma-enhanced CVD using FAS as a raw material. The water repellency of prepared films is evaluated by measuring contact angles of water drops. The contact angle of a water drop on the substrate is measured using a contact-anglemeter at 25°C in air. The chemical states of the films are studied using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The optical properties are measured using an ellipsometer and a double-beam spectrometer.

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