Use of Chemically Modified Wheat Gluten to Reduce Formaldehyde Emissions during Curing of Pigment Print Pastes on Fabrics

被引：0
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作者：
Scheyer, Lois E.
Polsani, Mounika
机构：
[1] University of Nebraska, Lincoln, NE, United States
[2] 234 Home Economics Building, University of Nebraska, Lincoln, NE 68583-0802, United States
来源：
| 2000年 / Wiley-VCH Verlag卷 / 52期
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D O I：
10.1002/1521-379X(200011)52:113.0.CO;2-J
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摘要：
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