IMPROVEMENTS IN DOSE UNIFORMITY ON HIGH CURRENT ION IMPLANTATION SYSTEMS.

被引：0
作者：
Eddy, R. [1 ]
Long, A. [1 ]
Smith, S. [1 ]
Tkach, J. [1 ]
机构：
[1] Varian Associates, Gloucester, MA,, USA, Varian Associates, Gloucester, MA, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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摘要：
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页码：424 / 427
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