Properties of catalytic CVD SiNx for antireflection coatings

被引:0
|
作者
JAIST , Ishikawa 923-1292, Japan [1 ]
机构
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Properties of catalytic CVD SiNx for antireflection coatings
    Izumi, A
    Matsumura, H
    PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS, 1999, 555 : 161 - 166
  • [2] Optical properties of PECVD and UVCVD SiNx:H antireflection coatings for silicon solar cells
    Lelièvre, JF
    Kaminski, A
    Boyeauk, JP
    Monna, R
    Lemiti, M
    Conference Record of the Thirty-First IEEE Photovoltaic Specialists Conference - 2005, 2005, : 1111 - 1114
  • [3] Numerical optimization of SiNx antireflection coatings for crystalline silicon on glass solar cells
    Beye, M.
    Faye, M. E.
    Ndiaye, A.
    Maiga, A. S.
    2013 IEEE CONFERENCE ON CLEAN ENERGY AND TECHNOLOGY (CEAT), 2013, : 368 - 372
  • [4] Microwave PECVD system for SiNx:H antireflection coatings and hydrogen passivation on multicrystalline silicon
    Fourmond, E
    Lemiti, M
    Trassy, C
    Laugier, A
    HIGH TEMPERATURE MATERIAL PROCESSES, 2003, 7 (02): : 231 - 240
  • [5] PROTECTING PROPERTIES AND BEHAVIOR OF ANTIREFLECTION COATINGS
    STEFANIAK, T
    OPTICA APPLICATA, 1979, 9 (04) : 277 - 279
  • [6] Analytical properties of the spectral characteristics of antireflection coatings
    T. V. Amochkina
    Moscow University Physics Bulletin, 2007, 62 (5) : 292 - 295
  • [8] NONEMPIRICAL MODELING ON SINX CVD
    ISHITANI, A
    KOSEKI, S
    NEC RESEARCH & DEVELOPMENT, 1992, 33 (01): : 1 - 6
  • [9] SiNx-submicrometer coatings -: Optimization of the film properties
    Tikana, L
    Pohl, M
    Zösch, A
    Zahn, W
    Wuttke, W
    MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK, 1999, 30 (02) : 72 - 76
  • [10] SiNx-submicrometer coatings:: Optimization of film properties
    Tikana, L
    Pohl, M
    Zösch, A
    Zahn, W
    Wuttke, W
    ADVANCED ENGINEERING MATERIALS, 2000, 2 (1-2) : 53 - 56