METHODS OF MEASURING SURFACE POTENTIALS OF AN IC BY USING THE ELECTRON BEAM.

被引：0
|
作者：
Nakahara, Kenji
Hayashi, Yutaka
Tarui, Yasuo
Kawashiro, Sanji
Narukami, Nagaaki
机构：
来源：
Bulletin of the Electrotechnical Laboratory, Tokyo | 1976年 / 40卷 / 4-5期
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中图分类号：
TN7 [基本电子电路];
学科分类号：
080902 ;
摘要：
Fundamental experiments and discussions are made of methods for measuring surface potentials of an IC by using the electron beam as contactless connections. The measurement is based on a phenomenon that the secondary electrons emitted from the specimen surface are very sensitive to the service potentials. The problems studied include 1) isolation of the signal from the emission contrast, 2) interaction of several electric fields caused by different potentials at different points on an IC, and 3) voltage supply to the surface of an IC.
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页码：380 / 386
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