Formation of specimen gratings for Moire interferometry applications

被引：0
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作者：
Gou, Y. [1 ]
Ifju, P. [2 ]
Boeman, R. [3 ]
Dai, F. [4 ]
机构：
[1] Motorola Semiconduct. Prod. Sector, Tempe, AZ, United States
[2] University of Florida, Gainesville, FL, United States
[3] Oak Ridge National Lab., Oakridge, TN, United States
[4] Tginghua University, Beijing, China
来源：
Experimental Techniques | / 23卷 / 05期
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页码：28 / 32
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