Nano-lithography by electron exposure using an Atomic Force Microscope

被引:0
|
作者
Univ of Jyvaskyla, Jyvaskyla, Finland [1 ]
机构
来源
Microelectron Eng | / 1卷 / 1-8期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Nano-lithography by electron exposure using an Atomic Force Microscope
    Davidsson, P
    Lindell, A
    Mäkelä, T
    Paalanen, M
    Pekola, J
    MICROELECTRONIC ENGINEERING, 1999, 45 (01) : 1 - 8
  • [2] Machining characterization of the nano-lithography process using atomic force microscopy
    Fang, TH
    Weng, CI
    Chang, JG
    NANOTECHNOLOGY, 2000, 11 (03) : 181 - 187
  • [3] Nano-lithography of polymer surfaces by Atomic Force Microscopy
    Blach, JA
    Watson, GS
    Brown, CL
    Pham, D
    Wright, J
    Nicolau, D
    Myhra, S
    BIOMEDICAL APPLICATIONS OF MICRO- AND NANOENGINEERING, 2002, 4937 : 285 - 293
  • [4] Nano-lithography using a resist, patterned by electron exposure in an AFM configuration
    Davidsson, P
    Lindell, A
    Pekola, J
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1996, 46 : 2837 - 2838
  • [5] Molecular dynamics simulation of nano-lithography process using atomic force microscopy
    Fang, TH
    Weng, CI
    Chang, JG
    SURFACE SCIENCE, 2002, 501 (1-2) : 138 - 147
  • [6] Magnetic nanostructures fabricated by the atomic force microscopy nano-lithography technique
    Watanabe, K
    Takemura, Y
    Shimazu, Y
    Shirakashi, J
    NANOTECHNOLOGY, 2004, 15 (10) : S566 - S569
  • [7] Calixarene electron beam resist for nano-lithography
    Fujita, J
    Ohnishi, Y
    Manako, S
    Ochiai, Y
    Nomura, E
    Sakamoto, T
    Matsui, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (12B): : 7769 - 7772
  • [8] Atomic force microscopy-based nano-lithography for nano-patterning: a molecular dynamic study
    Kim, YS
    Na, KH
    Choi, SO
    Yang, SH
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2004, 155 : 1847 - 1854
  • [9] Nano-oxidation of Si using ac modulation in atomic force microscope lithography
    Park, Cheol Hong
    Bae, Sukjong
    Lee, Haiwon
    COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2006, 284 : 552 - 555
  • [10] Study of overlay metrology in atomic force microscope lithography (overlaying lithography with atomic force microscope)
    Li, Xiaona
    Han, Li
    Gu, Wenqi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 3101 - 3104