DOUBLE-SIDED SILICON NITRIDE DEPOSITION OF WAFERS.

被引：0
|
作者：
Anon
机构：
来源：
| 1600年 / 28期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
INTEGRATED CIRCUIT MANUFACTURE
引用
收藏
相关论文
共 50 条
  • [31] STUDIES OF DOUBLE-SIDED, DOUBLE METAL-SILICON STRIP DETECTORS
    ALEXANDER, JP
    BEBEK, CJ
    BROWDER, TE
    DOBBINS, JA
    GRAY, SG
    HONSCHEID, K
    JONES, CD
    KATAYAMA, N
    KATRIS, JS
    SELEN, M
    WURTHWEIN, F
    GRONBERG, J
    MORRISON, RJ
    HALE, DL
    KORTE, C
    KYRE, S
    NELSON, HN
    NELSON, TK
    QIAO, C
    SPERKA, DJ
    TAJIMA, H
    CINABRO, D
    HENDERSON, S
    YAMAMOTO, H
    ARTUSO, M
    SOBOLEWSKI, Z
    CHAN, S
    COWEN, DF
    MILLER, JS
    BALEST, R
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1994, 342 (01): : 282 - 286
  • [32] Experimental and theoretical analysis of single-sided and double-sided chemical mechanical polishing of sapphire wafers
    Zhongyang Li
    Zhaohui Deng
    Jimin Ge
    Tao Liu
    Linlin Wan
    The International Journal of Advanced Manufacturing Technology, 2022, 119 : 5095 - 5106
  • [33] Experimental and theoretical analysis of single-sided and double-sided chemical mechanical polishing of sapphire wafers
    Li, Zhongyang
    Deng, Zhaohui
    Ge, Jimin
    Liu, Tao
    Wan, Linlin
    INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2022, 119 (7-8): : 5095 - 5106
  • [34] DOUBLE SIDED FREE POLISHING FOR LARGE SILICON-WAFERS
    KINOSHITA, M
    MINAMIYAMA, T
    MORISHITA, S
    EBATA, Y
    BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING, 1983, 17 (02): : 131 - 132
  • [35] INFLUENCE OF CARBON ON THE DEFECT GENERATION IN IG SILICON WAFERS.
    Tan, Songsheng
    Shen, Jinyuan
    Li, Yuezhen
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1986, 7 (05): : 489 - 496
  • [36] SCREEN-PRINTABLE POLYIMIDE COATING FOR SILICON WAFERS.
    Kulesza, Frank W.
    Estes, Richard H.
    Spanjer, Keith
    1600, (31):
  • [37] DOUBLE-SIDED DEWATERING
    WIGHTMAN, WS
    TAPPI, 1977, 60 (01): : 150 - 151
  • [38] Effective minority carrier lifetime in double-sided macroporous silicon
    Onyshchenko, V. F.
    Karachevtseva, L. A.
    SEMICONDUCTOR PHYSICS QUANTUM ELECTRONICS & OPTOELECTRONICS, 2020, 23 (01) : 29 - 36
  • [39] A system for multiplexed chip readout of double-sided silicon detectors
    Clemens, U
    Erven, W
    Gorke, H
    Kemmerling, G
    Maeckelburg, D
    Merzliakov, S
    Mussgiller, A
    Schleichert, R
    Zwoll, K
    2002 IEEE NUCLEAR SCIENCE SYMPOSIUM, CONFERENCE RECORD, VOLS 1-3, 2003, : 212 - 214
  • [40] A radiation damage test for double-sided silicon strip detectors
    Iwata, Y
    Ohsugi, T
    Ikeda, M
    Kitabayashi, H
    Ohmoto, T
    Kondo, T
    Unno, Y
    Terada, S
    Kohriki, T
    Takashima, R
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2002, 489 (1-3): : 114 - 120
12345