Dislocation structure formation in SiGe/Si multilayer heterostructures with low-temperature buffer layers

被引:0
|
作者
Vdovin, V.I.
Rzaev, M.M.
Yugova, T.G.
Muhlberger, M.
Schaffler, F.
机构
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:170 / 173
相关论文
共 50 条
  • [1] Dislocation structure formation in SiGe/Si(001) heterostructures with low-temperature buffer layers
    Vdovin, VI
    Mühlberger, M
    Rzaev, MM
    Schäffler, F
    Yugova, TG
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2002, 14 (48) : 13313 - 13318
  • [2] Thermally induced strain relaxation in SiGe/Si heterostructures with low-temperature buffer layers
    Vdovin, VI
    Yugova, TG
    Rzaev, MM
    Schäffler, F
    Mil'vidskii, MG
    Physica Status Solidi C - Conferences and Critical Reviews, Vol 2, No 6, 2005, 2 (06): : 1938 - 1942
  • [3] Reduction of dislocation density in mismatched SiGe/Si using a low-temperature Si buffer layer
    Linder, KK
    Zhang, FC
    Rieh, JS
    Bhattacharya, P
    Houghton, D
    APPLIED PHYSICS LETTERS, 1997, 70 (24) : 3224 - 3226
  • [4] Compliant effect of low-temperature Si buffer for SiGe growth
    Luo, YH
    Wan, J
    Forrest, RL
    Liu, JL
    Jin, G
    Goorsky, MS
    Wang, KL
    APPLIED PHYSICS LETTERS, 2001, 78 (04) : 454 - 456
  • [5] Relaxation mechanism of low temperature SiGe/Si(001) buffer layers
    Vescan, L
    Wickenhäuser, S
    SOLID-STATE ELECTRONICS, 2004, 48 (08) : 1279 - 1284
  • [6] Misfit dislocation dissociation and Lomer formation in low mismatch SiGe/Si heterostructures
    A. F. Marshall
    D. B. Aubertine
    W. D. Nix
    P. C. McIntyre
    Journal of Materials Research, 2005, 20 : 447 - 455
  • [7] Misfit dislocation dissociation and Lomer formation in low mismatch SiGe/Si heterostructures
    Marshall, AF
    Aubertine, DB
    Nix, WD
    McIntyre, PC
    JOURNAL OF MATERIALS RESEARCH, 2005, 20 (02) : 447 - 455
  • [8] On the low-temperature mobility of holes in gated oxide Si/SiGe heterostructures
    Lander, RJP
    Kearney, MJ
    Horrell, AI
    Parker, EHC
    Phillips, PJ
    Whall, TE
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1997, 12 (09) : 1064 - 1071
  • [9] Low-temperature buffer layer for growth of a low-dislocation-density SiGe layer on Si by molecular-beam epitaxy
    Chen, H
    Guo, LW
    Cui, Q
    Hu, Q
    Huang, Q
    Zhou, JM
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (02) : 1167 - 1169
  • [10] Low-temperature relaxation of ion-irradiated pseudomorphic SiGe/Si heterostructures
    Avrutin, V.S.
    Vyatkin, A.F.
    Izyumskaya, N.F.
    Smirnova, I.A.
    Vdovin, V.I.
    Yugova, T.G.
    Izvestiya Akademii Nauk. Ser. Fizicheskaya, 2002, 66 (02): : 176 - 179