Synchrotron radiation photoelectron emission microscopy of chemical-vapor-deposited diamond electron emitters

被引：0
|
作者：
Shovlin, J.D. [1 ]
Kordesch, M.E. [1 ]
Dunham, D. [2 ]
Tonner, B.P. [2 ]
Engel, W. [3 ]
机构：
[1] Department of Physics, Condensed Matter and Surface Sciences Program, Ohio University, Athens, OH 45701, United States
[2] Synchrotron Radiation Center, University of Wisconsin-Milwaukee, Milwaukee, WI 53211, United States
[3] Fritz Haber Institute der Max Planck Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 1995年 / 13卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1111 / 1115
相关论文
共 50 条
  • [41] TENSILE-STRENGTH OF SYNTHETIC CHEMICAL-VAPOR-DEPOSITED DIAMOND
    OLSON, DS
    REYNOLDS, GJ
    VIRSHUP, GF
    FRIEDLANDER, FI
    JAMES, BG
    PARTAIN, LD
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (08) : 5177 - 5179
  • [42] THE KINETICS OF CHEMICAL-VAPOR-DEPOSITED DIAMOND-OXYGEN REACTION
    ALAM, M
    SUN, Q
    JOURNAL OF MATERIALS RESEARCH, 1993, 8 (11) : 2870 - 2878
  • [43] FULLERENE FORMATION DURING PRODUCTION OF CHEMICAL-VAPOR-DEPOSITED DIAMOND
    CHOW, L
    WANG, H
    KLECKLEY, S
    DALY, TK
    BUSECK, PR
    APPLIED PHYSICS LETTERS, 1995, 66 (04) : 430 - 432
  • [44] LOCAL THERMAL-CONDUCTIVITY IN CHEMICAL-VAPOR-DEPOSITED DIAMOND
    GRAEBNER, JE
    JIN, S
    HERB, JA
    GARDINIER, CF
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (03) : 1552 - 1556
  • [45] HYDROGEN DESORPTION FROM CHEMICAL-VAPOR-DEPOSITED DIAMOND FILMS
    SCHULBERG, MT
    FOX, CA
    KUBIAK, GD
    STULEN, RH
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (07) : 3484 - 3490
  • [46] Recent results on chemical-vapor-deposited diamond microstrip detectors
    Bauer, C
    Baumann, I
    Colledani, C
    Conway, J
    Delpierre, P
    Djama, F
    Dulinski, W
    Fallou, A
    Gan, KK
    Gilmore, RS
    Grigoriev, E
    Hallewell, G
    Han, S
    Hessing, T
    Hubec, J
    Husson, D
    Kagan, H
    Kania, D
    Kass, R
    Kinnison, W
    Knopfle, KT
    Krammer, M
    Llewellyn, TJ
    Manfredi, PF
    Pan, LS
    Pernegger, H
    Pernicka, M
    Re, V
    Roe, S
    Rudge, A
    Schaeffer, M
    Schnetzer, S
    Somalwar, S
    Speziali, V
    Stone, R
    Trapper, RJ
    Tesarek, R
    Trischuk, W
    Turchetta, R
    Thomson, GB
    Wagner, R
    Weilhammer, P
    White, C
    Ziock, H
    Zoeller, MM
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1996, 380 (1-2): : 183 - 185
  • [47] Field emission measurements with mu m resolution on chemical-vapor-deposited polycrystalline diamond films
    Pupeter, N
    Gohl, A
    Habermann, T
    Mahner, E
    Muller, G
    Piel, H
    Niedermann, P
    Hanni, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 2056 - 2059
  • [48] Radiation hardness of a polycrystalline chemical-vapor-deposited diamond detector irradiated with 14 MeV neutrons
    Angelone, M
    Pillon, M
    Balducci, A
    Marinelli, M
    Milani, E
    Morgada, ME
    Pucella, G
    Tucciarone, A
    Verona-Rinati, G
    Ochiai, K
    Nishitani, T
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2006, 77 (02):
  • [49] NICKEL CHEMICAL-VAPOR-DEPOSITED DIAMOND INTERFACE STUDIED BY ELECTRON-ENERGY-LOSS SPECTROSCOPY
    EIMORI, N
    MORI, Y
    MOON, J
    HATTA, A
    MA, JS
    ITO, T
    HIRAKI, A
    DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) : 537 - 541
  • [50] Electron field emission from chemical vapor deposited diamond films
    Obraztsov, AN
    Pavlovsky, IY
    Volkov, AP
    Rakova, EV
    Nagovitsyn, SP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (07) : 2572 - 2576
12345