Effects of magnetic field gradient on crystallographic properties in tin-doped indium oxide films deposited by electron cyclotron resonance plasma sputtering

被引:0
|
作者
机构
[1] Kubota, Eishi
[2] Shigesato, Yuzo
[3] Igarashi, Masaru
[4] Haranou, Takeshi
[5] Suzuki, Kohichi
来源
Kubota, Eishi | 1600年 / 33期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] Influence of substrate temperature on the properties of tin-doped indium oxide thin films prepared by direct current magnetron sputtering
    Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
    Zhongguo Jiguang, 2008, 12 (2031-2035):
  • [42] Characterization of RF-enhanced DC sputtering to deposit tin-doped indium oxide thin films
    Univ of Tokyo, Tokyo, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 11 (6210-6214):
  • [43] Characterization of RF-enhanced DC sputtering to deposit tin-doped indium oxide thin films
    Futagami, T
    Shigesato, Y
    Yasui, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (11): : 6210 - 6214
  • [44] Origin of the crystalline orientation dependence of the electrical properties in tin-doped indium oxide films
    Kamei, M
    Enomoto, H
    Yasui, I
    THIN SOLID FILMS, 2001, 392 (02) : 265 - 268
  • [45] Ozone in reactive gas for producing tin-doped indium oxide films by DC reactive magnetron sputtering
    Alam, AHMZ
    Sasaki, K
    Hata, T
    THIN SOLID FILMS, 1996, 281 : 209 - 212
  • [46] Electrical properties of tin-doped indium oxide thin films prepared by a dip coating
    Seki, Y.
    Sawada, Y.
    Wang, M. H.
    Lei, H.
    Hoshi, Y.
    Uchida, T.
    CERAMICS INTERNATIONAL, 2012, 38 : S613 - S616
  • [47] Vertically aligned tin-doped indium oxide nanowire arrays: Epitaxial growth and electron field emission properties
    Wan, Q.
    Feng, P.
    Wang, T. H.
    APPLIED PHYSICS LETTERS, 2006, 89 (12)
  • [48] Epitaxial Indium Tin Oxide Film Deposited on Sapphire Substrate by Solid-Source Electron Cyclotron Resonance Plasma
    Kaneko, Satoru
    Torii, Hironori
    Soga, Masayasu
    Akiyama, Kensuke
    Iwaya, Motoaki
    Yoshimoto, Mamoru
    Amazawa, Takao
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (01)
  • [49] Properties of indium tin oxide films deposited using High Target Utilisation Sputtering
    Calnan, S.
    Upadhyaya, H. M.
    Thwaites, M. J.
    Tiwari, A. N.
    THIN SOLID FILMS, 2007, 515 (15) : 6045 - 6050
  • [50] Characteristics of zirconium-doped indium tin oxide thin films deposited by magnetron sputtering
    Zhang, Bo
    Dong, Xianping
    Xu, Xiaofeng
    Zhao, Pei
    Wu, Jiansheng
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2008, 92 (10) : 1224 - 1229