Effects of magnetic field gradient on crystallographic properties in tin-doped indium oxide films deposited by electron cyclotron resonance plasma sputtering

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[1] Kubota, Eishi

[2] Shigesato, Yuzo

[3] Igarashi, Masaru

[4] Haranou, Takeshi

[5] Suzuki, Kohichi

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Kubota, Eishi | 1600年 / 33期

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[31] TIN-DOPED AND INDIUM-DOPED ZINC-OXIDE FILMS PREPARED BY RF MAGNETRON SPUTTERING
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[32] Effects of microstructure on the optical properties of tin-doped indium oxide thin films studied by electron energy loss spectroscopy
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[33] ELECTRICAL AND OPTICAL-PROPERTIES OF TIN-DOPED INDIUM OXIDE-FILMS
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[34] Influence of surface conductivity on the optical properties of tin-doped indium oxide films
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[37] DEPOSITION OF TIN-DOPED INDIUM OXIDE-FILMS BY A MODIFIED REACTIVE MAGNETRON SPUTTERING PROCESS
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[38] Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering
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