SnO2 Nanocrystalline Thin Films by XPS

被引：55

作者：

Barreca, Davide ^{[1
]}

Garon, Simona ^{[2
]}

Tondello, Eugenio ^{[3
]}

Zanella, Pierino ^{[4
]}

机构：

[1] Dipartimento C.I.M.A., Universití di Padova, Via Loredan, 4, Padova,35131, Italy

[2] I.C.T.I.M.A., Corso Stati Uniti, 4, Padova,35127, Italy

[3] Dipartimento C.I.M.A., Universití di Padova, Via Loredan, 4, Padova,35131, Italy

[4] I.C.T.I.M.A., Corso Stati Uniti, 4, Padova,35127, Italy

来源：

Surface Science Spectra | 2000年 / 7卷 / 02期

关键词：

Nanocrystals - Alumina - Aluminum oxide - X ray photoelectron spectroscopy - Chemical vapor deposition - Thin films;

D O I：

10.1116/1.1288177

中图分类号：

学科分类号：

摘要：

SnO2 nanocrystalline thin films are deposited on Al2O3 and SiO2/Si(100) by chemical vapor deposition starting from diethylaminodimethylstannane (IV) [(CH3)2Sn(N(C2H5)2)2]. X-ray photoelectron spectra of the principal core levels for the surface of a SnO2 film on SiO2/Si(100) are presented. © 2000 American Vacuum Society.

引用

页码：81 / 85