Carbon nitride thin films deposited by the reactive ion beam sputtering technique

被引：0
|
作者：
Kobayashi, Satoshi [1 ]
Nozaki, Shinji [1 ]
Morisaki, Hiroshi [1 ]
Fukui, Shigeo [1 ]
Masaki, Susumu [1 ]
机构：
[1] Univ of Electro-Communications, Tokyo, Japan
来源：
Thin Solid Films | 1996年 / 281-282卷 / 1-2期
关键词：
Compendex;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：289 / 293
相关论文
共 10 条
  • [1] Properties of Al2O3 thin films deposited on 4H-SiC by reactive ion sputtering
    Fiorenza, P.
    Vivona, M.
    Di Franco, S.
    Smecca, E.
    Sanzaro, S.
    Alberti, A.
    Saggio, M.
    Roccaforte, F.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2019, 93 : 290 - 294
  • [2] Ion beam sputtering of Fe-Hf-O ferromagnetic thin films for EMI shielding applications
    Sarto, Maria Sabrina
    Sarto, Francesca
    Candidi, Marco
    IEEE International Symposium on Electromagnetic Compatibility, 2003, 1 : 181 - 186
  • [3] Preparation of BiFeO3 thin films on SrRuO3/SrTiO 3(001) substrate by dual ion beam sputtering
    Nakashima, Seiji
    Fujisawa, Hironori
    Suminaga, Hiroyuki
    Park, Jung Min
    Nishioka, Hiroshi
    Kobune, Masafumi
    Kanashima, Takeshi
    Okuyama, Masanori
    Shimizu, Masaru
    Japanese Journal of Applied Physics, 2011, 50 (9 PART 3)
  • [4] Structural and ferroelectric properties of domain-structure-controlled bifeo3 thin films prepared by dual-ion-beam sputtering
    Tanaka, Kiyotaka
    Tsukamoto, Yoshinori
    Hayakawa, Kazuo
    Yoshida, Yutaka
    Japanese Journal of Applied Physics, 2012, 51 (9 PART 2)
  • [5] Very thick mixture oxide ion beam sputtering films for investigation of nonlinear material properties
    Steinecke, Morten
    Kiedrowski, Kevin
    Jupe, Marco
    Ristau, Detlev
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2017, 80 (03)
  • [6] Effect of heat treatment on ion conductivity of hydrated ZrO2 thin films prepared by reactive sputtering using H2O gas
    Li, Ning
    Abe, Yoshio
    Kawamura, Midori
    Sasaki, Katsutaka
    Itoh, Hidenobu
    Suzuki, Tsutomu
    Japanese Journal of Applied Physics, 2011, 50 (4 PART 1)
  • [7] ON THE PROPERTIES OF ION-BEAM SPUTTERED CuInSe2 THIN FILMS.
    Bonhoure, F.
    Dagoury, G.
    Vigner, D.
    Lesueur, R.
    Vide, les Couches Minces, 1981, 36 (207): : 541 - 545
  • [8] Coloring and Bleaching Properties of 500–1000 nm-Thick Electrochromic Tungsten Oxide Films Deposited by Reactive Direct Current Magnetron Sputtering
    Mian, Md. Suruz
    Yagi, Riko
    Oya, Kei
    Nakano, Takeo
    Physica Status Solidi (A) Applications and Materials Science, 2022, 219 (05):
  • [9] Fabrication of MgAl2O4 thin films on ferromagnetic heusler Alloy Fe2CrSi by reactive magnetron sputtering
    Fukatani, Naoto
    Inagaki, Keima
    Mari, Kenichiro
    Fujita, Hirohito
    Miyawaki, Tetsuta
    Ueda, Kenji
    Asano, Hidefumi
    Japanese Journal of Applied Physics, 2012, 51 (2 PART 2)
  • [10] Oxygen gas barrier properties of hydrogenated amorphous carbon thin films deposited with a pulse-biased inductively coupled plasma chemical vapor deposition method
    Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
    不详
    Jpn. J. Appl. Phys., 8 PART 2
1