Synthesis and microstructural properties of tetrahedral amorphous carbon films

被引：0

作者：

Chen, Dihu ^{[1
,2
]}

Wei, Aixiang ^{[1
]}

Wong, S.P. ^{[2
]}

Peng, Shaoqi ^{[1
]}

Xu, J.B. ^{[2
]}

Wilson, I.H. ^{[2
]}

机构：

[1] Department of Physics, Zhongshan University, Guangzhou, China

[2] Department of Electronic Engineering, Chinese University of Hong Kong, Shatin, N.T., Hong Kong

来源：

Journal of Non-Crystalline Solids | 1999年 / 254卷

关键词：

Absorption spectroscopy - Atomic force microscopy - Chemical bonds - Crystal microstructure - Electric potential - Electron energy levels - Energy gap - Morphology - Raman spectroscopy - Semiconducting films - Surface roughness - Synthesis (chemical);

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Tetrahedral amorphous carbon (ta-C) films have been prepared using a magnetic field filtered plasma stream system. The optical and microstructural properties of these films as a function of the substrate bias voltage, Vb, have been studied using optical absorption spectroscopy, Raman spectroscopy and atomic force microscopy. The results show that ta-C films with larger fraction of sp3 bonding were formed when the substrate bias voltage was in the range from -10 to -50 V. The optical band gap is about 3.0 eV. The sp3 fraction in these films was estimated to be >80% by a fitting of the Raman spectra with a single skewed Lorentzian lineshape. The surface of such ta-C films was found to be smooth and uniform from the images of atomic force microscopy. The variations of the microstructural properties and surface morphology with Vb have been discussed in relation to evolution of the D and G Raman bands and root-mean-square surface roughness.

引用

页码：161 / 166