INTERNAL CLEANING METHOD FOR BROAD BEAM ION SOURCES.

被引:0
|
作者
Anon
机构
来源
IBM technical disclosure bulletin | 1985年 / 27卷 / 11期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:6751 / 6752
相关论文
共 50 条
  • [21] ACCELERATOR-SYSTEM SOLUTIONS FOR BROAD-BEAM ION SOURCES
    KAUFMAN, HR
    AIAA JOURNAL, 1977, 15 (07) : 1025 - 1034
  • [22] New Electrooptical Modulation Technique Adapted to Broad Band Sources.
    Goedgebuer, J.P.
    Ferriere, R.
    Porte, H.
    Journal of optics, 1984, 15 (06): : 403 - 407
  • [23] NOISE AND CORRELATION EFFECTS IN GaAlAs BROAD-BAND SOURCES.
    Dandridge, A.
    Taylor, H.F.
    Journal of Lightwave Technology, 1987, LT-5 (05) : 689 - 693
  • [24] METHOD FOR PASSIVE LOCATION OF SEISMIC SOURCES.
    Carlton, P.N.
    Fidler, R.W.
    Geoexploration Amsterdam, 1982, 20 (1 /2): : 131 - 146
  • [25] STABILITY OF LIQUID-METAL ION SOURCES.
    Vladimirov, V.V.
    Gorshkov, V.N.
    Applied physics. A, Solids and surfaces, 1988, A46 (02): : 131 - 136
  • [26] EMISSION PROPERTIES OF BROAD-BEAM VACUUM-ARC ION SOURCES
    RYABCHIKOV, AI
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (04): : 2425 - 2427
  • [27] BROAD-BEAM ION SOURCES - PRESENT STATUS AND FUTURE-DIRECTIONS
    KAUFMAN, HR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 764 - 771
  • [28] Broad beam ion implantation of boron in silicon with a compact broad beam ion implanter
    Schlemm, H
    Roth, D
    SURFACE & COATINGS TECHNOLOGY, 1999, 114 (01): : 81 - 84
  • [29] Broad beam ion implantation of boron in silicon with a compact broad beam ion implanter
    JENION - Ion Beam and Surface, Technique, Jena, Germany
    Surf Coat Technol, 1 (81-84):
  • [30] HIGH-POWER RELATIVISTIC ELECTRON BEAM SOURCES.
    Nation, John A.
    Advances in Electronics and Electron Physics, 1983, : 171 - 206