PREPARATION AND PROPERTIES OF AMORPHOUS BORON NITRIDE FILMS BY MOLECULAR FLOW CHEMICAL VAPOR DEPOSITION.
被引:0
作者:
Nakamura, Katsumitsu
论文数: 0引用数: 0
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机构:
Nihon Univ, Dep of Chemistry, Tokyo,, Jpn, Nihon Univ, Dep of Chemistry, Tokyo, JpnNihon Univ, Dep of Chemistry, Tokyo,, Jpn, Nihon Univ, Dep of Chemistry, Tokyo, Jpn
Nakamura, Katsumitsu
[1
]
机构:
[1] Nihon Univ, Dep of Chemistry, Tokyo,, Jpn, Nihon Univ, Dep of Chemistry, Tokyo, Jpn
来源:
Journal of the Electrochemical Society
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1985年
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132卷
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07期