PHOTOCHEMICAL VAPOR DEPOSITION OF AMORPHOUS SILICON AND ALLOYS FOR THIN FILM SOLAR CELLS.

被引：0

作者：

Baron, B.N. ^{[1
]}

Hegedus, S.S. ^{[1
]}

Jackson, S.C. ^{[1
]}

Rocheleau, R.E. ^{[1
]}

机构：

[1] Univ of Delaware, Newark, DE, USA, Univ of Delaware, Newark, DE, USA

来源：

| 1600年 / 21期

关键词：

539 Metals Corrosion and Protection; Metal Plating - 549 Nonferrous Metals and Alloys - 702 Electric Batteries and Fuel Cells - 712 Electronic and Thermionic Materials;

D O I：

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摘要：

(Edited Abstract)

引用

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[1] PHOTOCHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON AND ALLOYS FOR THIN-FILM SOLAR-CELLS
BARON, BN
HEGEDUS, SS
JACKSON, SC
ROCHELEAU, RE
SOLAR CELLS, 1987, 21 : 453 - 453
[2] AMORPHOUS-SILICON SOLAR-CELLS FABRICATED BY PHOTOCHEMICAL VAPOR-DEPOSITION
TANAKA, T
KIM, WY
KONAGAI, M
TAKAHASHI, K
APPLIED PHYSICS LETTERS, 1984, 45 (08) : 865 - 867
[3] Selective deposition of a silicon film on hydrogenated amorphous silicon by mercury sensitized photochemical vapor deposition
Hiramatsu, Masato, 1600, Publ by JJAP, Minato-ku, Japan (32):
[4] Low-temperature deposition of hydrogenated microcrystalline silicon thin films by photochemical vapor deposition technique and their application to thin film solar cells
Hiza, Shuichi
Yamada, Akira
Konagai, Makoto
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4A): : 1427 - 1431
[5] Low-temperature deposition of hydrogenated microcrystalline silicon thin films by photochemical vapor deposition technique and their application to thin film solar cells
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1-S9-9 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
不详
Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 1600, 4 A (1427-1431):
[6] Deposition and characterization of amorphous silicon with embedded nanocrystals and microcrystalline silicon for thin film solar cells
Ambrosio, R.
Moreno, M.
Torres, A.
Carrillo, A.
Vivaldo, I.
Cosme, I.
Heredia, A.
JOURNAL OF ALLOYS AND COMPOUNDS, 2015, 643 : S27 - S32
[7] Deposition and characterization of amorphous silicon with embedded nanocrystals and microcrystalline silicon for thin film solar cells
Ambrosio, R., 1600, Elsevier Ltd (643):
[8] Crystalline silicon films by chemical vapor deposition on glass for thin film solar cells
Bergmann, RB
Brendel, R
Wolf, M
Lolgen, P
Werner, JH
Krinke, J
Strunk, HP
CONFERENCE RECORD OF THE TWENTY FIFTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 1996, 1996, : 365 - 370
[9] Thin Film Solar Cells of Amorphous Silicon.
Kruehler, W.
Metall, 1985, 39 (08): : 729 - 733
[10] THE SELECTIVE DEPOSITION OF A SILICON FILM ON HYDROGENATED AMORPHOUS-SILICON BY MERCURY SENSITIZED PHOTOCHEMICAL VAPOR-DEPOSITION
HIRAMATSU, M
ISHIDA, A
KAMIMURA, T
KAWAKYU, Y
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (12B): : L1781 - L1783

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