Study of diamond film growth high rate by arc plasma spraying

被引：0

作者：

Lin, Shuquan ^{[1
]}

Shen, Boli ^{[1
]}

Tang, Dunyi ^{[1
]}

Liu, Haijun ^{[1
]}

Chen, Peiji ^{[1
]}

机构：

[1] Xi'an Jiaotong Univ, Xi'an, China

来源：

Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University | 1993年 / 27卷 / 05期

关键词：

Chemical vapor deposition - Electric arcs - Electric discharges - Thin films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Because diamond films have many excellent properties, so scientists in many countries pay great attention to them and many growth methods of diamond films have been studied. This paper describes the method using DC arc discharge plasma jet CVD to synthesize the diamond film. This is the method with highest rate and bigger crystal size at present. The process is that the mixture gas of methane and hydrogen flows through the plasma spray formed by DC arc discharge and spray it onto a water-cooled substrate, then the diamond crystal is grown. The growth rate is about 64 μm/h. By means of Raman spectra of the film it is verified that the film is diamond. The SEM photograph shows the form of crystal clearly.

引用

页码：25 / 28