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SPUTTERING DEPOSITION TRENDS.
被引：0
作者：
Anon
机构：
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D O I：
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中图分类号：
TG17 [金属腐蚀与保护、金属表面处理];
TQ153 [电镀工业];
学科分类号：
080503 ;
摘要：
Sputtering offers a solution to two well-known problems of evaporation: step coverage and alloy evaporation. However, sputtering could not be used as a solution until its own problems were solved. Only when the magnetron and DC techniques began to be used did sputtering of aluminum, its alloys and other metals become a useful alternative to evaporation.
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页码：43 / 55
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