Influence of light-soaking temperature on the distribution of thermal-annealing activation energies for photocreated dangling bonds in hydrogenated amorphous silicon

被引：0

作者：

Zhang, Qing ^{[1
]}

Takashima, Hideki ^{[1
]}

Kumeda, Minoru ^{[1
]}

Shimizu, Tatsuo ^{[1
]}

机构：

[1] Kanazawa Univ, Kanazawa, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 11期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：5933 / 5942

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[1] Influence of light-soaking temperature on the distribution of thermal-annealing activation energies for photocreated dangling bonds in hydrogenated amorphous silicon
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[2] LIGHT-INDUCED ANNEALING OF PHOTOCREATED DANGLING BONDS IN HYDROGENATED AMORPHOUS-SILICON
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[3] DANGLING BOND CREATION IN HYDROGENATED AMORPHOUS-SILICON BY LIGHT-SOAKING
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[7] Influence of hydrogen content and Si-H bond structure on photocreated dangling bonds in hydrogenated amorphous silicon films
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[8] Thermal annealing effects of dangling bonds in hydrogenated polymorphous silicon
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[9] Investigation of the spatial distribution of dangling bonds in light-soaked hydrogenated amorphous silicon
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[10] Investigation of the spatial distribution of dangling bonds in light-soaked hydrogenated amorphous silicon
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