Anomalous large thermoelectric power on heavily B-doped SiGe thin films with thermal annealing

被引：0
|
作者：
Kawahara, Toshio [1 ,2 ]
Lee, Sang Min [1 ,2 ]
Okamoto, Yoichi [1 ,2 ]
Morimoto, Jun [1 ,2 ]
Sasaki, Kimihiro [1 ,2 ]
Hata, Tomonobu [1 ,2 ]
机构：
[1] Department of Materials Science and Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka 239-8686, Japan
[2] Graduate School of Natural Science and Technology, Kanazawa University, 2-40-20 Kodatuno, Kanazawa 920-8667, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 2002年 / 41卷 / 8 B期
关键词：
D O I：
10.1143/jjap.41.l949
中图分类号：
学科分类号：
摘要：
12
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