Precise measurement of the deep defects and surface states in a-Si:H films by absolute CPM

被引:0
作者
Czech Acad of Sciences, Prague, Czech Republic [1 ]
机构
来源
J Non Cryst Solids | / pt 1卷 / 304-308期
关键词
This work was partially supported by the grants ASCR A1010528; EC-PECO 3029 and Copernicus 0027;
D O I
暂无
中图分类号
学科分类号
摘要
15
引用
收藏
相关论文
empty
未找到相关数据