Electronic structure of amorphous Si3N4: experiment and numerical simulation

被引:0
|
作者
Inst of Semiconductor Physics, Novosibirsk, Russia [1 ]
机构
来源
Appl Surf Sci | / 417-421期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] Effect of metal oxides addition on the preparation of Si3N4 whiskers by vaporization of amorphous Si3N4
    Kawai, C
    Yamakawa, A
    CERAMICS INTERNATIONAL, 1999, 25 (04) : 297 - 302
  • [22] Growth mechanism of α-Si3N4 submicron rods prepared from amorphous Si3N4 powders
    Hu, Zunlan
    Zhu, Tianbin
    Wu, Weiwei
    Peng, Zijun
    Hu, Feng
    Xie, Zhipeng
    CERAMICS INTERNATIONAL, 2018, 44 (17) : 22003 - 22007
  • [23] Crystallization behavior of amorphous Si3N4 powders
    Bing, W
    Qi, LG
    Miao, HZ
    RARE METAL MATERIALS AND ENGINEERING, 2003, 32 : 740 - 743
  • [24] PLASMA SINTERING OF ULTRAFINE AMORPHOUS SI3N4
    PAN, WX
    SATO, M
    YOSHIDA, T
    AKASHI, K
    ADVANCED CERAMIC MATERIALS, 1988, 3 (01): : 77 - 79
  • [25] Numerical simulation of intrinsic defects in SiO2 and Si3N4
    Gritsenko, VA
    Novikov, YN
    Shaposhnikov, AV
    Morokov, YN
    SEMICONDUCTORS, 2001, 35 (09) : 997 - 1005
  • [26] Numerical simulation of intrinsic defects in SiO2 and Si3N4
    V. A. Gritsenko
    Yu. N. Novikov
    A. V. Shaposhnikov
    Yu. N. Morokov
    Semiconductors, 2001, 35 : 997 - 1005
  • [27] Diffusion of 195Au in amorphous Si3N4 and Si4N3
    Voss, T
    Matics, S
    Strohm, A
    Frank, W
    Bilger, G
    PHYSICA B-CONDENSED MATTER, 2001, 308 (308-310) : 431 - 433
  • [28] Hardening mechanisms of amorphous/polycrystalline nanostructured multilayer films:: Si3N4/CrN and Si3N4/TiN
    Xu, JH
    Yu, LH
    Azuma, Y
    Hattori, K
    Fujimoto, T
    Kojima, I
    SURFACE ENGINEERING 2002-SYNTHESIS, CHARACTERIZATION AND APPLICATIONS, 2003, 750 : 193 - 198
  • [29] Electronic structure of β-Si3N4 crystals with substitutional icosagen group impurities
    Kutlu, E.
    Narin, P.
    Atmaca, G.
    Sarikavak-Lisesivdin, B.
    Lisesivdin, S. Bora
    Ozbay, E.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2017, 19 (3-4): : 278 - 282
  • [30] Electronic structure and physical properties of γ-Si3N4 under high pressure
    Ding Ying-Chun
    Xu Ming
    Pan Hong-Zhe
    Shen Yi-Bin
    Zhu Wen-Jun
    He Hong-Liang
    ACTA PHYSICA SINICA, 2007, 56 (01) : 117 - 122