Elastic constants and thermal expansion coefficient of metastable C49 TiSi2

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Jongste, J.F.
Loopstra, O.B.
Janssen, G.C.A.M.
Radelaar, S.
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| 1600年 / 73期
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[41]   A kinetic study of the C49 to C54 conversion in TiSi2 using electrical resistivity measurements on single sub-micron lines [J].
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[42]   Application of edge-to-edge matching model to understand the in-plane texture of TiSi2 (C49) thin films on (001)Si surface [J].
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[43]   THE C49 TO C54-TISI2 TRANSFORMATION IN SELF-ALIGNED SILICIDE APPLICATIONS [J].
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HONG, QZ .
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[44]   FORMATION OF METASTABLE C49 STRUCTURE IN TITANIUM DISILICIDE FILMS [J].
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Grimaldi, MG ;
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Marabelli, F ;
Bocelli, S ;
Santucci, S ;
Phani, AR .
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[46]   Low temperature formation of C54 TiSi2 bypassing the C49 phase:: Effect of Si crystallinity, metallic impurities and applications to 0.10 μm CMOS [J].
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[47]   Structural investigations of the C49-C54 transformation in TiSi2 thin films [J].
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[48]   Ab initio study of the elastic properties of TiSi2 [J].
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[49]   In situ TEM analysis of TiSi2 C49-C54 transformations during annealing [J].
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PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1996, 195 (02) :361-366
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