Measurements of Ti atom density and Ti ion density in inductively coupled plasma enhanced magnetron sputtering

被引:0
|
作者
Nakamura, Tadashi [1 ]
Okimura, Kunio [1 ]
机构
[1] Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan
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D O I
10.3131/jvsj.46.462
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摘要
9
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页码:462 / 465
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