Accelerated failure of bisphenol-A polysulfone during electron beam irradiation under an applied stress

被引：0

作者：

机构：

[1] Hill, David J.T.

[2] Lewis, David A.

[3] O'Donnell, James H.

来源：

Hill, David J.T. | 1600年 / 44期

关键词：

Electron Beams - Materials Testing--Creep - Moisture - Oxygen - Stresses;

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暂无

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摘要：

Bisphenol-A polysulfone, poly(oxy-1,4-phenylene-sulfonyl-1,4-phenyleneoxy-1, 4-phenyleneisopropylidene-1,4-phenylene), PSF (I) showed greatly reduced resistance to electron beam irradiation when subjected simultaneously to an applied tensile stress. The creep rate increased, and the time (dose) to failure of the sample decreased with increasing stress. The failure strain was constant for different applied stresses. Air, oxygen, and moisture caused decreases in radiation resistance compared with a dry nitrogen atmosphere. Increasing the irradiation temperature from 0 to 90°C resulted in substantially decreased radiation resistance.

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