Optimum phase condition for low-contrast X-ray masks

被引：0
|
作者：
Fujii, Kiyoshi [1 ]
Suzuki, Katsumi [1 ]
Matsui, Yasuji [1 ]
机构：
[1] Super-fine SR Lithography Laboratory, Assoc. Super-Adv. Electronics T., 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 12 B期
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D O I：
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学科分类号：
摘要：
6
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页码：7076 / 7079
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