Effects of deposition methods on the properties of silicon nitride and silicon oxynitride films

被引：0
|
作者：
Hirao, Takashi [1 ]
Kitagawa, Masatoshi [1 ]
Kamada, Takeshi [1 ]
Tsukamoto, Kazuyoshi [1 ]
Yoshioka, Yoshiaki [1 ]
Kuramasu, Keizaburo [1 ]
Korechika, Tetsuhiro [1 ]
Wasa, Kiyotaka [1 ]
机构：
[1] Matsushita Electric Industrial Co, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 09期
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摘要：
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页码：1609 / 1615
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